Hetai deionized pure water system Basic-Q30

The Lab
Model：Basic-Q30

Resistivity: 13-17.5 MΩ.cm
Conductivity: 0.067-0.055 μs/cm
Particulate matter (>0.22μm)：<1/ml
microorganism /bacteria: <1CFU/ml
Yield: 30 liters /Hour

¥6360

Hetai deionized pure water system Basic-Q45

The Lab
Model：Basic-Q45

Resistivity: 13-17.5 MΩ.cm
Conductivity: 0.067-0.055 μs/cm
Particulate matter (>0.22μm)：<1/ml
microorganism /bacteria: <1CFU/ml
Yield: 45 liters /Hour

¥9328

Hetai deionized pure water machine Edi-Q10UT

The Lab
Model：Edi-Q10UT

Resistivity: >5MΩ.cm
Total organic carbon (TOC)：<30 ppb

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Hetai deionized pure water machine Edi-Q10

The Lab
Model：Edi-Q10

Resistivity: >5MΩ.cm
Total organic carbon (TOC) ：<30 ppb

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Hetai double-stage reverse osmosis ultrapure water machine Medium-RS60

The Lab
Model：Medium-RS60

Resistivity: 18.2 MΩ.cm
Heavy metal ions: <0.1ppb
microorganism /bacteria: <1 CFU/ml
Particulate matter (>0.22μm)：<1/ml

¥47488

Hetai double-stage reverse osmosis ultrapure water machine Medium-RS45

The Lab
Model：Medium-RS45

Resistivity: 18.2 MΩ.cm
Heavy metal ions: <0.1ppb
microorganism /bacteria: <1 CFU/ml
Particulate matter (>0.22μm)：<1/ml

¥45368

Hetai double-stage reverse osmosis ultrapure water machine Medium-RS30

The Lab
Model：Medium-RS30

Resistivity: 18.2 MΩ.cm
Heavy metal ions: <0.1ppb
microorganism /bacteria: <1 CFU/ml
Particulate matter (>0.22μm)：<1/ml

¥43248

Hetai double-stage reverse osmosis deionized pure water machine Medium-RQ60

The Lab
Model： Medium-RQ60

Resistivity: 10-18.2 MΩ.cm
Heavy metal ions: <0.1ppb
microorganism /bacteria: <1 CFU/ml
Particulate matter (>0.22μm)：<1/ml

¥31588

Hetai double-stage reverse osmosis deionized pure water machine Medium-RQ45

The Lab
Model：Medium-RQ45

Resistivity: 10-18.2 MΩ.cm
Heavy metal ions: <0.1ppb
microorganism /bacteria: <1 CFU/ml
Particulate matter (>0.22μm)：<1/ml

¥29468

Hetai double-stage reverse osmosis deionized pure water machine Medium-RQ30

The Lab
Model：Medium-RQ3

Resistivity: 10-18.2 MΩ.cm
Heavy metal ions: <0.1ppb
microorganism /bacteria: <1 CFU/ml
Particulate matter (>0.22μm)：<1/ml

¥27348

Hetai ultrapure water machine Edi-S10UF

The Lab
Model：Edi-S10UF

Resistivity: 18.2 MΩ.cm@25℃
Heavy metal ions: < 0.1 ppb

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Hetai ultrapure water machine Edi-S10UV

The Lab
Model：Edi-S10UV

Resistivity: 18.2 MΩ.cm@25℃
Heavy metal ions: < 0.1 ppb

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